Plasma processing
Plasma processing is a plasma-based material processing technology that aims at modifying the chemical and physical properties of a surface. Plasma processing techniques include: Plasma activation Plasma ashing Plasma cleaning Plasma electrolytic oxidation Plasma etching Plasma functionalization Plasma polymerization Corona treatment Plasma modification Related topics are plasma chemistry, chemical vapor deposition, and physical vapor deposition processes like sputter deposition, plasma iondoping, vacuum plasmaspraying, and reactive ion etching.
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Plasma processing is a plasma-based material processing technology that aims at modifying the chemical and physical properties of a surface.[1]
Plasma processing techniques include:
- Plasma activation
- Plasma ashing
- Plasma cleaning
- Plasma electrolytic oxidation
- Plasma etching
- Plasma functionalization
- Plasma polymerization
- Corona treatment
- Plasma modification
Related topics are plasma chemistry, chemical vapor deposition, and physical vapor deposition processes like sputter deposition, plasma iondoping, vacuum plasmaspraying, and reactive ion etching.
References
[edit]- ^ National Research Council (1991). Plasma Processing of Materials: Scientific Opportunities and Technological Challenges. Washington, DC: National Academies Press. doi:10.17226/1875. ISBN 978-0-309-04597-1.